Structural characterization of cubic GaN grown on GaAs(001) substrates

被引:0
|
作者
Zheng, XH [1 ]
Qu, B
Wang, YT
Yang, H
Liang, JW
Han, JY
机构
[1] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
[2] Chinese Acad Geol Sci, Inst Minerals & Resources, Beijing 100037, Peoples R China
来源
CHINESE JOURNAL OF ELECTRONICS | 2001年 / 10卷 / 02期
关键词
cubic GaN; X-ray double crystal diffraction; structural characteristics;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Structural characteristics of cubic GaN epilayers grown on GaAs(001) were studied using X-ray double-crystal diffraction technique. The structure factors of cubic GaN(002) and (004) components are approximately identical. However, the integrated intensities of the rocking curve for cubic (002) components are over five times as those of (004) components. The discrepancy has been interpreted in detail considering other factors. In the conventional double crystal rocking curve, the peak broadening includes such information caused by the orientation distribution (mosaicity) and the distribution of lattice spacing. These two kinds of distributions can be distinguished by the triple-axis diffraction in which an analyser crystal is placed in front of the detector. Moreover, the peak broadening was analysed by reciprocal lattice construction and Eward sphere. By using triple-axis diffraction of cubic (002) and (113) components, domain size and dislocation density were estimated. The fully relaxed lattice parameter of cubic GaN was determined to be about 0.451 +/- 0.001nm.
引用
收藏
页码:219 / 222
页数:4
相关论文
共 50 条
  • [41] Structural and optical characterization of high In content cubic InGaN on GaAs(001) substrates by R-F-MBE
    Nakamura, Teruyuki
    Endo, Yuta
    Katayama, Ryuji
    Yaguchi, Hiroyuki
    Onabe, Kentaro
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4 NO 7 2007, 2007, 4 (07): : 2437 - +
  • [42] Influence of MBE growth temperature on the properties of cubic GaN grown directly on GaAs substrates
    Georgakilas, A
    Androulidaki, M
    Tsagraki, K
    Amimer, K
    Constantinidis, G
    Pelekanos, NT
    Calamiotou, M
    Czigany, Z
    Pecz, B
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1999, 176 (01): : 525 - 528
  • [43] Cubic GaN films grown below the congruent sublimation temperature of (001) GaAs substrates by plasma-assisted molecular beam epitaxy
    Alanis, Arturo
    Vilchis, Heber
    Lopez, Edgar
    Vidal, Miguel A.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (02):
  • [44] MBE growth of cubic GaN on GaAs substrates
    Yang, H
    Brandt, O
    Ploog, K
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1996, 194 (01): : 109 - 120
  • [45] Structural study of GaN grown on (001) GaAs by organometallic vapor phase epitaxy
    In-Tae Bae
    Tae-Yeon Seong
    Young Ju Park
    Eun Kyu Kim
    Journal of Electronic Materials, 1999, 28 : 873 - 877
  • [46] Structural study of GaN grown on (001) GaAs by organometallic vapor phase epitaxy
    Bae, IT
    Seong, TY
    Park, YJ
    Kim, EK
    JOURNAL OF ELECTRONIC MATERIALS, 1999, 28 (07) : 873 - 877
  • [47] MBE growth and Raman studies of cubic and hexagonal GaN films on (001)-oriented GaAs substrates
    Liu, HF
    Chen, H
    Li, ZQ
    Wan, L
    Huang, Q
    Zhou, JM
    Yang, N
    Tao, K
    Han, YJ
    Luo, Y
    JOURNAL OF CRYSTAL GROWTH, 2000, 218 (2-4) : 191 - 196
  • [48] Investigation of thickness dependence of hexagonal component in cubic GaN film grown on GaAs (001) by MOVPE
    Taki, T
    Koukitu, A
    Seki, H
    BLUE LASER AND LIGHT EMITTING DIODES II, 1998, : 113 - 116
  • [49] Stability investigation of cubic GaN films grown by metalorganic chemical vapor deposition on GaAs (001)
    Sun, XL
    Yang, H
    Zheng, LX
    Xu, DP
    Li, JB
    Wang, YT
    Li, GH
    Wang, ZG
    APPLIED PHYSICS LETTERS, 1999, 74 (19) : 2827 - 2829
  • [50] Micro-Raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate
    Tabata, A
    Lima, AP
    Leite, JR
    Lemos, V
    Schikora, D
    Schöttker, A
    Köhler, U
    As, DJ
    Lischka, K
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1999, 14 (04) : 318 - 322