Thick-film phenomenon in high-heat-flux evaporation from cylindrical pores

被引:18
|
作者
Khrustalev, D
Faghri, A
机构
[1] Department of Mechanical Engineering, University of Connecticut, Storrs, CT
来源
关键词
D O I
10.1115/1.2824220
中图分类号
O414.1 [热力学];
学科分类号
摘要
A physical and mathematical model of the evaporating thick liquid film, attached to the liquid-vapor meniscus in a circular micropore, has been developed. The liquid pow has been coupled with the vapor flow along the liquid-vapor interface. The model includes quasi-one-dimensional compressible steady-state momentum conservation for the vapor and also a simplified description of the microfilm at the end of the thick film. The numerical results, obtained for water, demonstrate that formation of extended thick liquid films in micropores can take place due to high-velocity vapor flow under high rates of vaporization. The model has also predicted that the available capillary pressure significantly changes with the wall-vapor superheat and other operational conditions.
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页码:272 / 278
页数:7
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