Evaluation of an automated spectroscopic ellipsometer for in-line process control

被引：0

作者：

Pickering, C ^{[1
]}

Russell, J ^{[1
]}

Nayar, V ^{[1
]}

Imschweiler, J ^{[1
]}

Wille, H ^{[1
]}

Harrington, S ^{[1
]}

Wiggins, C ^{[1
]}

Stehlé, JL ^{[1
]}

Piel, JP ^{[1
]}

Bruchez, J ^{[1
]}

机构：

[1] Def Evaluat & Reg Agcy, Malvern WR14 3PS, Worcs, England

来源：

CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY | 1998年 / 449卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The performance of an automatic spectroscopic ellipsometer, the SOPRA Multi-Layer Monitor (MLM) has been evaluated in the Defence Evaluation and Reasearch Agency's Cleanroom over a one-year period on representative CMOS/Bipolar wafer structures supplied by IC manufacturers. Precision, stability, throughput and accuracy have been assessed for ONO, OPO, oxide, Si/SiGe and PECVD nitride/metal wafers. Examples are given to illustrate the ability of the MLM to discriminate variations due to intrinsic and deliberately-induced process changes, as well as cross-wafer uniformity. Both monitor and patterned product wafers have been measured and the inadequacy of relying on monitor wafers demonstrated.

引用

页码：347 / 351

页数：5

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