Evaluation of an automated spectroscopic ellipsometer for in-line process control

被引：0

作者：

Pickering, C ^{[1
]}

Russell, J ^{[1
]}

Nayar, V ^{[1
]}

Imschweiler, J ^{[1
]}

Wille, H ^{[1
]}

Harrington, S ^{[1
]}

Wiggins, C ^{[1
]}

Stehlé, JL ^{[1
]}

Piel, JP ^{[1
]}

Bruchez, J ^{[1
]}

机构：

[1] Def Evaluat & Reg Agcy, Malvern WR14 3PS, Worcs, England

来源：

CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY | 1998年 / 449卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The performance of an automatic spectroscopic ellipsometer, the SOPRA Multi-Layer Monitor (MLM) has been evaluated in the Defence Evaluation and Reasearch Agency's Cleanroom over a one-year period on representative CMOS/Bipolar wafer structures supplied by IC manufacturers. Precision, stability, throughput and accuracy have been assessed for ONO, OPO, oxide, Si/SiGe and PECVD nitride/metal wafers. Examples are given to illustrate the ability of the MLM to discriminate variations due to intrinsic and deliberately-induced process changes, as well as cross-wafer uniformity. Both monitor and patterned product wafers have been measured and the inadequacy of relying on monitor wafers demonstrated.

引用

页码：347 / 351

页数：5

共 50 条

[21] In-line rheological measurements for extrusion process control
Univ of Bradford
[J]. Measurement and Control, 1995, 28 (01): : 10 - 16
[22] Lithography process control using in-line metrology
Spaziani, Nicolas
Inglebert, Rene-Louis
Massin, Jean
[J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2, 2012, 8324
[23] AUTOMATED IN-LINE MEASUREMENT OF PLUTONIUM SOLUTIONS IN A PLUTONIUM PURIFICATION PROCESS
LI, TK
[J]. NUCLEAR TECHNOLOGY, 1981, 55 (03) : 674 - 682
[24] Design and in-line raman spectroscopic monitoring of a protein batch crystallization process
Mercado J.
Alcalà M.
Karry K.M.
Ríos-Steiner J.L.
Romañach R.J.
[J]. Journal of Pharmaceutical Innovation, 2008, 3 (4) : 271 - 279
[25] A parallel detecting, spectroscopic ellipsometer for intelligent process control of continuously deposited CIGS films
Simpson, LJ
Joshi, BS
Gonzales, LA
Verley, J
Furtak, TE
[J]. NEW METHODS, MECHANISMS AND MODELS OF VAPOR DEPOSITION, 2000, 616 : 9 - 14
[26] AUTOMATED IN-LINE WAFER PROCESSOR
不详
[J]. SOLID STATE TECHNOLOGY, 1984, 27 (06) : 69 - 70
[27] IN-LINE RHEOLOGICAL MEASUREMENTS FOR EXTRUSION PROCESS-CONTROL
COATES, PD
[J]. MEASUREMENT & CONTROL, 1995, 28 (01): : 10 - 16
[28] IN-LINE PARTICLE SIZING FOR PROCESS CONTROL IN NEW DIMENSIONS
Wolfgang Witt
Michael Heuer
Markus Schaller
[J]. Particuology, 2004, (04) : 185 - 188
[29] In-line SEM based ADC for advanced process control
Tomlinson, W
Halliday, B
Farrington, D
Skumanich, A
[J]. 2000 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2000, : 131 - 137
[30] Etch and CMP process control using in-line AFM
Trenkler, T
Kraiss, T
Mantz, U
Weidner, P
Pinto, RH
[J]. SOLID STATE TECHNOLOGY, 2004, 47 (07) : 101 - +

← 1 2 3 4 5 →