Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

被引：6
|
作者：
Yetim, Ali Fatih [1 ]
Efeoglu, Ihsan [2 ]
Celik, Ayhan [2 ]
Alsaran, Akgun [2 ]
Kaymaz, Irfan [2 ]
机构：
[1] Ataturk Univ, Fac Engn, Dept Met Engn, TR-25240 Erzurum, Turkey
[2] Ataturk Univ, Fac Engn, Dept Mech Engn, TR-25240 Erzurum, Turkey
来源：
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY | 2011年 / 25卷 / 13期
关键词：
Deposition; magnetron sputtering; thin films; nanocomposites; adhesion; COATINGS; STRESS;
D O I：
10.1163/016942410X549933
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011
引用
收藏
页码：1497 / 1505
页数：9
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