Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

被引：6

作者：

Yetim, Ali Fatih ^{[1
]}

Efeoglu, Ihsan ^{[2
]}

Celik, Ayhan ^{[2
]}

Alsaran, Akgun ^{[2
]}

Kaymaz, Irfan ^{[2
]}

机构：

[1] Ataturk Univ, Fac Engn, Dept Met Engn, TR-25240 Erzurum, Turkey

[2] Ataturk Univ, Fac Engn, Dept Mech Engn, TR-25240 Erzurum, Turkey

来源：

JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY | 2011年 / 25卷 / 13期

关键词：

Deposition; magnetron sputtering; thin films; nanocomposites; adhesion; COATINGS; STRESS;

D O I：

10.1163/016942410X549933

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011

引用

页码：1497 / 1505

页数：9

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