Calculation of the vertical and horizontal electron mobilities in InAs/GaSb superlattices

被引:10
|
作者
Szmulowicz, F. [1 ]
Brown, G. J. [2 ]
机构
[1] Univ Dayton, Res Inst, Dayton, OH 45469 USA
[2] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
关键词
INTERFACE ROUGHNESS SCATTERING; SEMICONDUCTOR SUPERLATTICES; LOW-TEMPERATURE; TRANSPORT;
D O I
10.1063/1.3584865
中图分类号
O59 [应用物理学];
学科分类号
摘要
Efficient perpendicular transport of carriers by drift and diffusion in InAs/GaSb superlattice-based devices is necessary for achieving high device figures of merit. However, the values of perpendicular mobilities are usually inferred indirectly or through nonstandard experiments. Treating perpendicular and transverse mobilities on equal footing, we present here the results of a calculation of low-temperature perpendicular and transverse electron mobilities in InAs/GaSb superlattices as limited by interface-roughness scattering. Using the calculated mobility curves, it is possible to infer the value of the vertical mobility from measurements of the horizontal mobility. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3584865]
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