Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge

被引:26
|
作者
Seo, SH
In, JH
Chang, HY
Han, JG
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Low Temp Plasma Lab, Taejon 305701, South Korea
[2] Sungkyunkwan Univ, Dept Met Engn, Suwon 440746, South Korea
关键词
D O I
10.1063/1.1946900
中图分类号
O59 [应用物理学];
学科分类号
摘要
The time-resolved probe measurements of the plasma parameters and the electron energy distribution function are carried out in a unipolar pulsed dc magnetron argon discharge. The cathode target is driven by the 20 kHz midfrequency unipolar dc pulses at three operating modes, such as constant voltage, constant power, and constant current with the duty cycles ranging from 10% to 90%. It is observed that as the duty cycle is reduced, the electron temperature averaged during the pulse-on period rapidly increases irrespective of the operating mode although the average electron density strongly depends on the operating mode. The comparison of the measured electron energy distribution functions shows that the electron heating during the pulse-on period becomes efficient in the pulse operation with short duty cycle, which is closely related to the deep penetration of the high-voltage sheath into the bulk during the pulse-on period.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 50 条
  • [31] PLASMA PARAMETERS OF A PULSED VACUUM DISCHARGE
    SYSUN, VI
    KHROMOI, YD
    HIGH TEMPERATURE, 1984, 22 (03) : 366 - 371
  • [32] PLASMA PARAMETERS IN A PULSED DISCHARGE IN A LIQUID
    OKUN, IZ
    SOVIET PHYSICS TECHNICAL PHYSICS-USSR, 1971, 16 (02): : 227 - &
  • [33] Plasma parameters in 40 MHz Argon discharge
    Azooz, A. A.
    Cakir, S.
    Bleej, D. A.
    RESULTS IN PHYSICS, 2015, 5 : 85 - 91
  • [34] COMPARISON OF SOME BASIC PLASMA PARAMETERS AND DISCHARGE CHARACTERISTICS OF PLANAR MAGNETRON SPUTTERING DISCHARGES IN ARGON AND NEON
    PETROV, I
    IVANOV, I
    ORLINOV, V
    KOURTEV, J
    CONTRIBUTIONS TO PLASMA PHYSICS, 1990, 30 (02) : 223 - 231
  • [35] Role of Argon plasma on the Structural and Morphological Properties of Silicon Nitride Films by Pulsed DC Glow Discharge
    Abbas, K.
    Ahmad, R.
    Khan, I. A.
    Ikhlaq, U.
    Saleem, S.
    Ahson, R.
    2013 INTERNATIONAL CONFERENCE ON AEROSPACE SCIENCE & ENGINEERING (ICASE), 2013, : 80 - 84
  • [36] Effect of duty cycle on the electrical and optical properties of VOx film deposited by pulsed reactive magnetron sputtering
    Dong Xiang
    Wu Zhiming
    Xu Xiangdong
    Wei Xiongbang
    Jiang Yadong
    2013 INTERNATIONAL CONFERENCE ON OPTICAL INSTRUMENTS AND TECHNOLOGY: OPTOELECTRONIC DEVICES AND OPTICAL SIGNAL PROCESSING, 2013, 9043
  • [37] Effects of duty cycle on microstructure and corrosion behavior of TiC coatings prepared by DC pulsed plasma CVD
    Shanaghi, Ali
    Rouhaghdam, Ali Reza Sabour
    Ahangarani, Shahrokh
    Chu, Paul K.
    Farahani, Taghi Shahrabi
    APPLIED SURFACE SCIENCE, 2012, 258 (07) : 3051 - 3057
  • [38] Effect of plasma parameters on the structure of CNx layers deposited by DC magnetron sputtering
    Ujvári, T
    Szikora, B
    Mohai, M
    Tóth, A
    Keresztury, G
    Bertóti, I
    DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 1200 - 1204
  • [39] DC and High Current Pulsed Magnetron Discharge for Generation of Boron Plasmas
    Vizir, A. V.
    Oks, E. M.
    Shandrikov, M. V.
    Yushkov, G. Yu.
    2016 27TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV), VOL 2, 2016,
  • [40] Electron density modulation in an asymmetric bipolar pulsed dc magnetron discharge
    Karkari, S. K.
    Ellingboe, A. R.
    Gaman, C.
    Swindells, I.
    Bradley, J. W.
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (06)