Plasma chemistry, basic processes, and PECVD

被引：0
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作者：
Flamm, DL
机构：
来源：
PLASMA PROCESSING OF SEMICONDUCTORS | 1997年 / 336卷
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：23 / 59
页数：37
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