Plasma chemistry, basic processes, and PECVD

被引：0
|
作者：
Flamm, DL
机构：
来源：
PLASMA PROCESSING OF SEMICONDUCTORS | 1997年 / 336卷
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：23 / 59
页数：37
相关论文
共 50 条
  • [21] Mapping Plasma Chemistry in Hydrocarbon Fuel Processing Processes
    Dae Hoon Lee
    Kwan-Tae Kim
    Young-Hoon Song
    Woo Suk Kang
    Sungkwon Jo
    Plasma Chemistry and Plasma Processing, 2013, 33 : 249 - 269
  • [22] Mapping Plasma Chemistry in Hydrocarbon Fuel Processing Processes
    Lee, Dae Hoon
    Kim, Kwan-Tae
    Song, Young-Hoon
    Kang, Woo Suk
    Jo, Sungkwon
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2013, 33 (01) : 249 - 269
  • [23] Plasma-chemical processes in petroleum chemistry (review)
    D. I. Slovetskii
    Petroleum Chemistry, 2006, 46 : 295 - 304
  • [24] Bases and Basic Materials in Industrial and Environmental Chemistry: A Review of Commercial Processes
    Busca, Guido
    INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2009, 48 (14) : 6486 - 6511
  • [25] BASIC PLASMA KINETIC PROCESSES IN ELECTRICALLY EXCITED MOLECULAR LASERS
    NIGHAN, WL
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1971, 16 (12): : 1422 - &
  • [26] Computer simulation of gas-phase plasma chemistry and silicon ion cluster formation during PECVD
    Stekolnikov, AF
    Feshchenko, DV
    Metelskiy, TA
    Belich, RF
    PHYSICS, CHEMISTRY AND APPLICATION OF NANOSTRUCTURES: REVIEWS AND SHORT NOTES TO NANOMEETING-2001, 2001, : 424 - 427
  • [27] Diamond growth chemistry in a microwave PECVD reactor
    Farhat, S
    Silva, F
    Hassouni, K
    Gicquel, A
    Scott, CD
    PROCEEDINGS OF THE FIFTH INTERNATIONAL SYMPOSIUM ON DIAMOND MATERIALS, 1998, 97 (32): : 1 - 19
  • [28] PECVD of Vertical Graphene: Local Plasma or Nonlocal Plasma?
    Xiong, Fangzhu
    Qian, Fengsong
    Sun, Jie
    Guo, Weiling
    Li, Longfei
    Xie, Yiyang
    Du, Zaifa
    Dong, Yibo
    Wang, Le
    Xu, Chen
    NANO, 2022, 17 (10)
  • [29] BASIC CHEMISTRY
    SAWYER, PB
    IEEE SPECTRUM, 1995, 32 (12) : 8 - 8
  • [30] LASER-ENHANCED GAS-SURFACE CHEMISTRY - BASIC PROCESSES AND APPLICATIONS
    CHUANG, TJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 798 - 806
12345