Laser-Induced Damage on Silica Glasses by Irradiation of Soft X-Ray Laser Pulse

被引：2
|
作者：
Mikami, K. [1 ]
Ishino, M. [1 ]
Dinh, T. -H. [1 ]
Yamamoto, Y. [1 ]
Hasegawa, N. [1 ]
Nishikino, M. [1 ]
Kawachi, T. [1 ]
Motokoshi, S. [2 ]
Jitsuno, T. [3 ]
机构：
[1] Natl Inst Quantum & Radiol Sci & Technol, Kansai Photon Sci Inst, Kyoto, Japan
[2] Inst Laser Technol, Osaka, Japan
[3] Osaka Univ, Insititute Laser Engn, Osaka, Japan
来源：
X-RAY LASERS 2016 | 2018年 / 202卷
关键词：
D O I：
10.1007/978-3-319-73025-7_50
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Laser-induced damage thresholds (LIDTs) on silica glass was evaluated with soft X-ray laser (SXRL) pulses. Silica glass is one of the most useful materials for near-infrared and visible laser systems. The high-photon energy of the SXRL would have great potential to study the laser-induced damage mechanisms. The LIDTs on silica glass measured by 13.9-nm, 7-ps SXRL pulses were several dozen of mJ/cm(2) as the experimental results. The damage morphologies are estimated by a simple 1D calculation.
引用
收藏
页码：333 / 337
页数：5
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