Laser-Induced Damage on Silica Glasses by Irradiation of Soft X-Ray Laser Pulse

被引：2

作者：

Mikami, K. ^{[1
]}

Ishino, M. ^{[1
]}

Dinh, T. -H. ^{[1
]}

Yamamoto, Y. ^{[1
]}

Hasegawa, N. ^{[1
]}

Nishikino, M. ^{[1
]}

Kawachi, T. ^{[1
]}

Motokoshi, S. ^{[2
]}

Jitsuno, T. ^{[3
]}

机构：

[1] Natl Inst Quantum & Radiol Sci & Technol, Kansai Photon Sci Inst, Kyoto, Japan

[2] Inst Laser Technol, Osaka, Japan

[3] Osaka Univ, Insititute Laser Engn, Osaka, Japan

来源：

X-RAY LASERS 2016 | 2018年 / 202卷

关键词：

D O I：

10.1007/978-3-319-73025-7_50

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laser-induced damage thresholds (LIDTs) on silica glass was evaluated with soft X-ray laser (SXRL) pulses. Silica glass is one of the most useful materials for near-infrared and visible laser systems. The high-photon energy of the SXRL would have great potential to study the laser-induced damage mechanisms. The LIDTs on silica glass measured by 13.9-nm, 7-ps SXRL pulses were several dozen of mJ/cm(2) as the experimental results. The damage morphologies are estimated by a simple 1D calculation.

引用

页码：333 / 337

页数：5

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