Low-frequency noise in AlGaN/GaN high electron mobility transistors irradiated by γ-ray quanta

被引:0
|
作者
Vitusevich, SA [1 ]
Klein, N [1 ]
Petrychuk, MV [1 ]
Belyaev, AE [1 ]
Danylyuk, SV [1 ]
Konakova, RV [1 ]
Avksentyev, AY [1 ]
Danilchenko, BA [1 ]
Tilak, V [1 ]
Smart, J [1 ]
Vertiatchikh, A [1 ]
Eastman, LF [1 ]
机构
[1] Forschungszentrum Julich, Inst Schichten & Grenzfluchen, D-52425 Julich, Germany
关键词
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暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Room temperature current-voltage and noise measurements have been made before and after gamma irradiation on AlGaN/GaN high electron mobility transistors (HEMTs) grown on sapphire. The saturation current due to radiation-induced defects shows a nonlinear dependence on radiation dose. The deviation of the device parameters does not exceed 20% at highest radiation dose 10(9) Rad and the devices with larger gate lengths demonstrate a higher radiation hardness to the Co-60 gamma rays. The noise spectra of devices after gamma irradiation follow the flicker noise (1/f(gamma)) dependence with the exponent gamma close to one. The Hooge parameter estimated for the HEMTs after gamma irradiation dose does not show a gate-bias dependence and increases by approximately three to five times at radiation dose 2 x 10(8) Rad. The analysis of noise spectra allowed to identify the major sources of noise generation in the investigated HEMT heterostructures.
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页码:78 / 81
页数:4
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