Review on Alkali Element Doping in Cu(In, Ga)Se2 Thin Films and Solar Cells

被引:94
|
作者
Sun, Yun [1 ]
Lin, Shuping [1 ]
Li, Wei [2 ]
Cheng, Shiqing [1 ]
Zhang, Yunxiang [1 ]
Liu, Yiming [3 ]
Liu, Wei [1 ]
机构
[1] Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Coll Elect Informat & Opt Engn, Tianjin 300071, Peoples R China
[2] Engn Res Ctr Nanostruct Thin Film Solar Cell, Beijing 102211, Peoples R China
[3] Univ Southern Denmark, Mads Clausen Inst, DK-6400 Sonderborg, Denmark
关键词
Alkali elements; Cu(In; Ga)Se-2; Thin-film solar cells; Post-deposition treatment; CU(IN; GA)SE-2; NA; CUINSE2; SODIUM;
D O I
10.1016/J.ENG.2017.04.020
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reviews the development history of alkali element doping on Cu(In, Ga)Se-2 (CIGS) solar cells and summarizes important achievements that have been made in this field. The influences of incorporation strategies on CIGS absorbers and device performances are also reviewed. By analyzing CIGS surface structure and electronic property variation induced by alkali fluoride (NaF and KF) post-deposition treatment (PDT), we discuss and interpret the following issues: (1)The delamination of CIGS thin films induced by Na incorporation facilitates CuInSe2 formation and inhibits Ga during low-temperature co-evaporation processes. (2) The mechanisms of carrier density increase due to defect passivation by Na at grain boundaries and the surface. (3) A thinner buffer layer improves the short-circuit current without open-circuit voltage loss. This is attributed not only to better buffer layer coverage in the early stage of the chemical bath deposition process, but also to higher donor defect (Cd-Cu(+)) density, which is transferred from the acceptor defect (V-Cu(-)) and strengthens the buried homojunction. (4) The KF-PDT-induced lower valence band maximum at the absorber surface reduces the recombination at the absorber/buffer interface, which improves the open-circuit voltage and the fill factor of solar cells. (C) 2017 THE AUTHORS. Published by Elsevier LTD on behalf of the Chinese Academy of Engineering and Higher Education Press Limited Company.
引用
收藏
页码:452 / 459
页数:8
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