Gate control and amplification of magnetoresistance in a three-terminal device

被引:6
|
作者
Kum, Hyun [1 ]
Jahangir, Shafat [1 ]
Basu, Debashish [1 ]
Saha, Dipankar [2 ]
Bhattacharya, Pallab [1 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Nanoscale Photon & Spintron, Ann Arbor, MI 48109 USA
[2] Indian Inst Technol, Dept Elect Engn, Ctr Excellence Nanoelect, Bombay 400076, Maharashtra, India
关键词
INJECTION;
D O I
10.1063/1.3652765
中图分类号
O59 [应用物理学];
学科分类号
摘要
Gate control and amplification of magnetoresistance are demonstrated at room temperature in a fully epitaxial three-terminal GaAs-based device. In addition to the two ferromagnetic spin injector and detector electrodes of a MnAs/AlAs/GaAs:Mn/AlAs/MnAs vertical spin valve, a third non-magnetic gate electrode (Ti/Au) is placed directly on top of the heavily p-doped GaAs channel layer. The magnetoresistance of the device can be amplified to reach values as high as 500% at room temperature with the application of a bias to the gate terminal, which modulates the spin selectivity of the tunnel barriers. The experimental results are modeled by solving spin drift-diffusion and tunneling equations self consistently. (C) 2011 American Institute of Physics. [doi:10.1063/13652765]
引用
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页数:3
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