Interface roughness correlation in tungsten/silicon multilayers

被引：1

作者：

Jergel, M ^{[1
]}

Holy, V ^{[1
]}

Majkova, E ^{[1
]}

Luby, S ^{[1
]}

Senderak, R ^{[1
]}

机构：

[1] MASARYK UNIV,FAC SCI,DEPT SOLID STATE PHYS,CS-61137 BRNO,CZECH REPUBLIC

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1996年 / 156卷 / 1-3期

关键词：

D O I：

10.1016/0304-8853(95)00808-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

X-ray reflectivity and diffuse scattering measurements at grazing incidence Have been made using Cu K-alpha 1 radiation on obliquely deposited W/Si multilayers. The specular and non-specular scans were simulated by a Fresnel optical computational code and within the distorted-wave Born approximation, respectively. Rougher and vertically less correlated interfaces are evidenced with increasing deposition angle, thus revealing an increased tendency for agglomeration.

引用

页码：117 / 118

页数：2

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