Interface roughness correlation in tungsten/silicon multilayers

X-ray reflectivity and diffuse scattering measurements at grazing incidence Have been made using Cu K-alpha 1 radiation on obliquely deposited W/Si multilayers. The specular and non-specular scans were simulated by a Fresnel optical computational code and within the distorted-wave Born approximation, respectively. Rougher and vertically less correlated interfaces are evidenced with increasing deposition angle, thus revealing an increased tendency for agglomeration.