Performance analysis of asymmetric dielectric modulated dual short gate tunnel field effect transistor

被引:6
|
作者
Pon, Adhithan [1 ]
Carmel, A. Santhia [1 ]
Bhattacharyya, A. [1 ]
Ramesh, R. [1 ]
机构
[1] SASTRA Univ, Sch Elect & Elect Engn, Device Modeling Lab, Thanjavur, India
关键词
DGTFET; Asymmetric gate; Pocket doping; Heterojunction; Dielectric modulation; TFET;
D O I
10.1016/j.spmi.2017.11.043
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this work, a novel asymmetric dielectric modulated dual short gate (ADMDG) TFET is designed and their performance was analysed. The ADMDG TFET using silicon, germanium, and SiGe as channel and source materials were simulated and results are compared with conventional DGTFET. The device simulation has been performed using Sentaurus TCAD simulator. It is found that the proposed structure provides overall improved performance for silicon TFET such as higher on-current (I-on = 4.2 mu A), smaller SS = 40mV/decade and maximum I-on/I-off ratio (8.2 x 10(10)) compared to conventional DGTFET. The on-current values obtained for SiGe source, Ge source and Ge channel ADMDG TFET are 0.22 mA, 0.69 mA and 0.14 mA respectively compared to silicon ADMDG TFET but compromises other dc parameters such as SS and I-on/I-off ratio. For CMOS circuits, the p-type silicon TFET of the proposed structure were also simulated and presented. Moreover, the proposed TFET structure is also simulated for different temperatures and its performance were compared and analysed. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:608 / 615
页数:8
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