Frequency dispersion of capacitance-voltage characteristics in wide bandgap semiconductor-electrolyte junctions

被引:12
|
作者
Frolov, D. S. [1 ]
Zubkov, V. I. [1 ]
机构
[1] St Petersburg Electrotech Univ LETI, Dept Micro & Nanoelect, Prof Popov Str 5, St Petersburg 197376, Russia
关键词
electrochemical capacitance-voltage profiling; ECV; wide bandgap semiconductors; impurity concentration; frequency dispersion of capacitance; DIAMOND;
D O I
10.1088/0268-1242/31/12/125013
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The frequency dispersion of capacitance-voltage characteristics and derived charge carrier concentration with application to the junction between an electrolyte and wide band-gap semiconductors are investigated. To expand the measurement frequency range, the precision LCR-meter Agilent E4980A was connected to the electrochemical cell ECVPro Nanometrics via a specially designed switch unit. The influence of series resistance and degree of dopant ionization on the frequency dispersion of CV-measured characteristics are discussed. It was shown that in wide band-gap semiconductors one can get both total and ionized dopant concentration, depending on the test frequency choice for capacitance measurements.
引用
下载
收藏
页数:6
相关论文
共 50 条
  • [21] CAPACITANCE-VOLTAGE CHARACTERISTICS GAUGE
    GREBENNIKOV, AA
    SUKHAREV, YG
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1976, 19 (02) : 598 - 598
  • [22] HOT CARRIER INJECTION ACROSS SEMICONDUCTOR-ELECTROLYTE JUNCTIONS
    TURNER, JA
    COOPER, G
    PARKINSON, B
    NOZIK, AJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1982, 184 (SEP): : 126 - PHYS
  • [23] CAPACITANCE-VOLTAGE CHARACTERISTICS OF SUPERLATTICES
    ALESHKIN, VY
    ZVONKOV, BN
    LINKOVA, ER
    MUREL, AV
    ROMANOV, YA
    SEMICONDUCTORS, 1993, 27 (06) : 504 - 507
  • [24] Capacitance-voltage characterization of metal-insulator-semiconductor capacitors formed on wide-bandgap semiconductors with deep dopants such as diamond
    Hiraiwa, Atsushi
    Okubo, Satoshi
    Ogura, Masahiko
    Fu, Yu
    Kawarada, Hiroshi
    JOURNAL OF APPLIED PHYSICS, 2022, 132 (12)
  • [25] Nonmonotonous Capacitance-Voltage Characteristics in Metal-Glass-Semiconductor Structures
    Vlasov, S. I.
    Nasirov, A. A.
    Mamatkarimov, O. O.
    Ergasheva, M. A.
    SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY, 2008, 44 (03) : 250 - 251
  • [26] EFFECT OF SEMICONDUCTOR THICKNESS ON CAPACITANCE-VOLTAGE CHARACTERISTICS OF AN MOS CAPACITOR.
    Nagai, Kiyoko
    Hayashi, Yutaka
    1659, (23):
  • [27] CAPACITANCE-VOLTAGE CHARACTERISTICS OF MULTIPLE-QUANTUM-WELL SEMICONDUCTOR HETEROSTRUCTURES
    ERSHOV, M
    RYZHII, V
    SAITO, K
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (10) : 2118 - 2122
  • [28] Nonmonotonous capacitance-voltage characteristics in metal-glass-semiconductor structures
    S. I. Vlasov
    A. A. Nasirov
    O. O. Mamatkarimov
    M. A. Ergasheva
    Surface Engineering and Applied Electrochemistry, 2008, 44
  • [29] An automated installation for investigating current-voltage and capacitance-voltage characteristics of semiconductor devices
    Kremin', V.T.
    Pribory i Tekhnika Eksperimenta, 1998, 41 (01): : 68 - 72
  • [30] MODELLING OF THE FREQUENCY DEPENDENCE OF CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL-SEMICONDUCTOR CONTACT WITH QUANTUM DOT LAYER
    Ilchenko, V. V.
    Panarin, K. Y.
    Buyanin, A. A.
    Marin, V. V.
    Shkil, N. V.
    Tretyak, O. V.
    JOURNAL OF PHYSICAL STUDIES, 2008, 12 (01):