Gate oxide leakage current analysis and reduction for VLSI circuits

被引:80
|
作者
Lee, D [1 ]
Blaauw, D [1 ]
Sylvester, D [1 ]
机构
[1] Univ Michigan, Ann Arbor, MI 48109 USA
关键词
D O I
10.1109/TVLSI.2003.821553
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper we address the growing issue of gate oxide leakage current (I-gate) at the circuit level. Specifically, we develop a fast approach to analyze the total leakage power of a large circuit block, considering both Igate and subthreshold leakage (I-sub). The interaction between I-gate and I-gate complicates analysis in arbitrary CMOS topologies and we propose simple and accurate heuristics based on lookup tables to quickly estimate the state-dependent total leakage current for arbitrary circuit topologies. We apply this method to a number of benchmark circuits using a projected 100-nm technology and demonstrate accuracy within 0.09% of SPICE on average with a four order of magnitude speedup. We then make several observations on the impact of I-gate in designs that are standby power limited, including the role of device ordering within a stack and the differing state dependencies for NOR versus HAND topologies. Based on these observations, we propose the use of pin reordering as a means to reduce I-gate. We find that for technologies with appreciable I-gate, this technique is more effective at reducing total leakage current in standby mode than state assignment, which is often used for I-sub reduction.
引用
收藏
页码:155 / 166
页数:12
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