Fabrication of nanomagnet arrays by shadow deposition on self-organized semiconductor substrates

被引:34
|
作者
Teichert, C [1 ]
Barthel, J [1 ]
Oepen, HP [1 ]
Kirschner, J [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
关键词
D O I
10.1063/1.123154
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is demonstrated how large-scale arrays of nanomagnets can be efficiently fabricated by shadow deposition onto faceted surfaces of self-organized Si1-xGex films. By pulsed laser deposition of Co in a grazing incidence geometry, we succeeded to cover just one selected type of facets resulting in isolated Co patches with an areal density of about 0.25X10(12)/in.(2). These uniformly oriented nanomagnets have a parallelogram-shaped base with about 25 nmX35 nm edge lengths. Magneto-optic Kerr effect measurements reveal a clear in-plane anisotropy of the nanomagnets. (C) 1999 American Institute of Physics. [S0003-6951(99)01004-9].
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收藏
页码:588 / 590
页数:3
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