Fabrication of nanomagnet arrays by shadow deposition on self-organized semiconductor substrates

被引：34

作者：

Teichert, C ^{[1
]}

Barthel, J ^{[1
]}

Oepen, HP ^{[1
]}

Kirschner, J ^{[1
]}

机构：

[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany

来源：

APPLIED PHYSICS LETTERS | 1999年 / 74卷 / 04期

关键词：

D O I：

10.1063/1.123154

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

It is demonstrated how large-scale arrays of nanomagnets can be efficiently fabricated by shadow deposition onto faceted surfaces of self-organized Si1-xGex films. By pulsed laser deposition of Co in a grazing incidence geometry, we succeeded to cover just one selected type of facets resulting in isolated Co patches with an areal density of about 0.25X10(12)/in.(2). These uniformly oriented nanomagnets have a parallelogram-shaped base with about 25 nmX35 nm edge lengths. Magneto-optic Kerr effect measurements reveal a clear in-plane anisotropy of the nanomagnets. (C) 1999 American Institute of Physics. [S0003-6951(99)01004-9].

引用

页码：588 / 590

页数：3

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