Influence of technological parameters on the mechanical properties of titanium nitride films deposited by hot target reactive sputtering

被引：2
|
作者：
Kozin, A. A. [1 ]
Shapovalov, V. I. [1 ]
Smirnov, V. V. [1 ]
Useinov, A. S. [2 ]
Kravchuk, K. S. [2 ]
Gladkikh, E. V. [2 ]
Zavyalov, A. V. [1 ]
Morozova, A. A. [1 ]
机构：
[1] St Petersburg Electrotech Univ LETI, St Petersburg, Russia
[2] Technol Inst Superhard & Novel Carbon Mat, Troitsk, Russia
来源：
24TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2017年 / 872卷
基金：
俄罗斯科学基金会;
关键词：
COATINGS;
D O I：
10.1088/1742-6596/872/1/012019
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The impact of the discharge current density and nitrogen flowrate on the mechanical properties of titanium nitride films deposited by reactive magnetron sputtering of a hot target was studied. It was found that the films deposited at the highest discharge current density have the highest hardness and modulus of elasticity. These films have a texture with a significant predominance of the peak corresponding to the [111] direction in a face-centered cubic lattice of TiN.
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页数：3
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