Influence of technological parameters on the mechanical properties of titanium nitride films deposited by hot target reactive sputtering

被引：2

作者：

Kozin, A. A. ^{[1
]}

Shapovalov, V. I. ^{[1
]}

Smirnov, V. V. ^{[1
]}

Useinov, A. S. ^{[2
]}

Kravchuk, K. S. ^{[2
]}

Gladkikh, E. V. ^{[2
]}

Zavyalov, A. V. ^{[1
]}

Morozova, A. A. ^{[1
]}

机构：

[1] St Petersburg Electrotech Univ LETI, St Petersburg, Russia

[2] Technol Inst Superhard & Novel Carbon Mat, Troitsk, Russia

来源：

24TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2017年 / 872卷

基金：

俄罗斯科学基金会;

关键词：

COATINGS;

D O I：

10.1088/1742-6596/872/1/012019

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The impact of the discharge current density and nitrogen flowrate on the mechanical properties of titanium nitride films deposited by reactive magnetron sputtering of a hot target was studied. It was found that the films deposited at the highest discharge current density have the highest hardness and modulus of elasticity. These films have a texture with a significant predominance of the peak corresponding to the [111] direction in a face-centered cubic lattice of TiN.

引用

页数：3

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