Field-enhanced nonequilibrium C/V and I/V characteristics of MOS capacitor under linear voltage ramp bias

被引:1
|
作者
Zhang, X
Ding, K
机构
[1] Department of Electronic Engineering, Hangzhou University, Hangzhou
来源
关键词
C/V and I/V characteristics; MOS capacitance; nonequilibrium;
D O I
10.1049/ip-cds:19960724
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A theoretical method is presented to analytically describe nonequilibrium C/V and I/V characteristics of an MOS capacitor under linear voltage ramp bias. Unlike previous theories the carrier emission probability is assumed to be field-dependent and therefore the transients are known as field enhanced. The one-dimensional Poole-Frenkel model is used to describe the carrier-emission probability dependent on the applied electric field. It has been verified that this model is available for coulombic centres. A differential equation is established to describe the change of the space-charge region width with time. The MOS capacitance and gate current are related to the space-charge region width. In this way the field enhanced nonequilibrium C/V and I/V characteristics are obtained.
引用
收藏
页码:343 / 347
页数:5
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