Spectrophotometric determination of silicon in ultrapure, dilute hydrofluoric acid solutions

被引：14
|
作者：
Proost, J. [1 ]
Santoro, R. [1 ]
Abu Jeriban, S. [1 ]
Guiot, I. [1 ]
机构：
[1] Univ Catholique Louvain, Div Mat & Proc Engn, B-1348 Louvain, Belgium
来源：
MICROCHEMICAL JOURNAL | 2008年 / 89卷 / 01期
关键词：
spectrophotometry; silicon; ultrapure; hydrofluoric acid;
D O I：
10.1016/j.microc.2007.11.004
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
A new analytical procedure is described for the spectrophotometric determination of silicon in ultrapure, dilute hydrofluoric acid (HF) solutions. The method is,a variation of the classical molybdenum blue method, but adds optimised quantities of boric acid to eliminate any HF interference in the colorimetric process. Its sensitivity and detection limit have been evaluated as, respectively, (180 +/- 9)(.)10(-5)/(mu g/L Si) and 7.6 mu g/L Si, and its reproducibility has been confin-ned. The method has also been successfully applied and validated for the determination of the etch rate of single crystalline silicon surfaces in ultrapure 2% v/v HF solutions. (C) 2007 Elsevier B.V. All rights reserved.
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页码：48 / 51
页数：4
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