Dark current mechanisms in quantum dot laser structures

被引:9
|
作者
Hasbullah, N. F. [1 ,2 ]
David, J. P. R. [1 ]
Mowbray, D. J. [3 ]
机构
[1] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
[2] Int Islamic Univ Malaysia, Dept Elect & Comp Engn, Kuala Lumpur 53100, Malaysia
[3] Univ Sheffield, Dept Phys & Astron, Sheffield S3 7RH, S Yorkshire, England
基金
英国工程与自然科学研究理事会;
关键词
THRESHOLD CURRENT-DENSITY; HOPPING CONDUCTION; TEMPERATURE-DEPENDENCE; IMPROVED PERFORMANCE; GROWTH-TEMPERATURE; SPACER LAYER; PHOTOLUMINESCENCE; SILICON;
D O I
10.1063/1.3596524
中图分类号
O59 [应用物理学];
学科分类号
摘要
Current-voltage measurements have been performed on InAs/InGaAs/GaAs quantum dot structures with varying growth and design parameters. These measurements show that the forward and reverse bias dark currents decrease with increasing spacer growth temperature, however, they are relatively insensitive to the number of periods of the quantum dot layers. Temperature dependent current-voltage measurements show that the mechanism that governs the reverse bias leakage current is due to generation-recombination via mid-band traps assisted by the Frenkel-Poole emission of carriers from these traps. (C) 2011 American Institute of Physics. [doi:10.1063/1.3596524]
引用
收藏
页数:5
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