In situ real-time study of chemical etching process of Si(100) using light scattering

被引：14
|
作者：
Zhao, YP
Wu, YJ
Yang, HN
Wang, GC
Lu, TM
机构：
[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECT & ELECT MFG,TROY,NY 12180
[2] NATL TAIWAN OCEAN UNIV,DIV GEN EDUC,CHILUNG,TAIWAN
来源：
APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 02期
关键词：
D O I：
10.1063/1.117378
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report the development of an in situ real-time light scattering technique to study the wet chemical etching process of Si(100), Based on a simple scattering theory, the number of etch pits and other statistical parameters such as correlation length and interface width on a pitted surface are extracted from the scattering profile. The time evolution of the surface morphology can be interpreted by a simple rate equation. (C) 1996 American Institute of Physics.
引用
收藏
页码：221 / 223
页数：3
相关论文
共 50 条
  • [41] In situ, real-time detection of soot particles coated with NaCl using 193 nm light
    J.H. Choi
    C.B. Stipe
    C.P. Koshland
    D. Lucas
    Applied Physics B, 2006, 84 : 385 - 388
  • [42] Multiwavelength ellipsometry for real-time process control of the plasma etching of patterned samples
    Maynard, HL
    Layadi, N
    Lee, JTC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (01): : 109 - 115
  • [43] IN-SITU SPECTRAL ELLIPSOMETRY FOR REAL-TIME THICKNESS MEASUREMENT - ETCHING MULTILAYER STACKS
    HENCK, SA
    DUNCAN, WM
    LOWENSTEIN, LM
    BUTLER, SW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1179 - 1185
  • [44] Real-time in situ imaging of the delamination of thin Ta films on Si(100) substrates via a synchrotron radiation technique
    French, BL
    Bilello, JC
    THIN FILMS: STRESSES AND MECHANICAL PROPERTIES IX, 2002, 695 : 385 - 390
  • [45] Real-time monitoring of InAs/GaAs quantum dot growth using ultraviolet light scattering
    Pinnington, T
    Levy, Y
    MacKenzie, JA
    Tiedje, T
    PHYSICAL REVIEW B, 1999, 60 (23): : 15901 - 15909
  • [46] Blue light emission from a glass/liquid interface for real-time monitoring of a laser-induced etching process
    Cheng, Ji-Yen
    Mousavi, Mansoureh Z.
    Wu, Chun-Ying
    Tsai, Hsieh-Fu
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2011, 21 (07)
  • [47] Real-time detection system of defects on a photo mask by using the light scattering and interference method
    Jo, Jae Heung
    Lee, Sangon
    Wee, Hae Sung
    Kim, Jong Soo
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV, PT 1 AND PT 2, 2011, 7971
  • [48] 'Real-time' multiwavelength ellipsometry diagnostics for monitoring dry etching of Si and TiNx deposition
    Kechagias, VG
    Gioti, M
    Logothetidis, S
    Benferhat, R
    Teer, D
    THIN SOLID FILMS, 2000, 364 (1-2) : 213 - 219
  • [49] REAL-TIME PROCESS MANAGEMENT FOR MATERIALS COMPOSITION IN CHEMICAL MANUFACTURING
    DAMBROSIO, B
    FEHLING, MR
    FORREST, S
    RAULEFS, P
    WILBER, BM
    IEEE EXPERT-INTELLIGENT SYSTEMS & THEIR APPLICATIONS, 1987, 2 (02): : 80 - 93
  • [50] INTEGRATING EXPERT SYSTEMS INTO A REAL-TIME CHEMICAL PROCESS ENVIRONMENT
    KERSHNER, VV
    PRUITT, TP
    EXPERT SYSTEMS AND THE LEADING EDGE IN PRODUCTION AND OPERATIONS MANAGEMENT: PROCEEDINGS OF THE THIRD INTERNATIONAL CONFERENCE, 1989, : 577 - 587
12345