Laser devices by selective-area epitaxy

被引:0
|
作者
Lammert, RM
Coleman, JJ
机构
来源
关键词
semiconductor lasers; selective-area epitaxy; monolithic integration; low-threshold; wavelength division multiplexing; nonabsorbing mirrors;
D O I
10.1117/12.264213
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The design and operation of strained-laser InGaAs-GaAs laser sources fabricated by selective-area epitaxy (SAE) are presented, These devices include lasers with low threshold currents, lasers with nonabsorbing miners, and dual channel sources, The low threshold lasers have threshold currents as low as 2.65 mA for an uncoated device and 0,97 mA for a coated device. The lasers with nonabsorbing mirrors exhibited optical powers up to similar to 325 mW/facet (4 mu m wide output aperture), which is a > 40% increase over conventional SAE lasers. The dual channel source is capable of coupling two discrete optical sources into a single mode fiber without the need for an external coupler.
引用
收藏
页码:2 / 14
页数:13
相关论文
共 50 条
  • [41] SUMMARY ABSTRACT - SELECTIVE-AREA EPITAXY OF GAAS THROUGH SILICON DIOXIDE WINDOWS BY MOLECULAR-BEAM EPITAXY
    HONG, JM
    WANG, S
    FLOOD, JD
    MERZ, JL
    SANDS, T
    WASHBURN, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (02): : 629 - 630
  • [42] Improved size control of InP nanopyramids by selective-area flow rate modulation epitaxy
    Oga, R
    Yamamoto, S
    Ohzawa, I
    Fujiwara, Y
    Takeda, Y
    JOURNAL OF CRYSTAL GROWTH, 2002, 237 : 239 - 243
  • [43] SELECTIVE-AREA EPITAXY OF GAINAS USING CONVENTIONAL AND NOVEL GROUP-III PRECURSORS
    SCHOLZ, F
    OTTENWALDER, D
    ECKEL, M
    WILD, M
    FRANKOWSKY, G
    WACKER, T
    HANGLEITER, A
    JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) : 242 - 248
  • [44] Selective-area growth and characterization of cubic GaN grown by metalorganic vapor phase epitaxy
    Suwanyangyaun, Pattana
    Sanorpim, Sakuntam
    Onabe, Kentaro
    THIN SOLID FILMS, 2020, 709 (709)
  • [45] SELECTIVE-AREA GROWTH OF III/V MATERIALS IN METALORGANIC MOLECULAR-BEAM EPITAXY (CHEMICAL BEAM EPITAXY)
    HEINECKE, H
    JOURNAL OF CRYSTAL GROWTH, 1994, 136 (1-4) : 18 - 28
  • [46] SELECTIVE-AREA EPITAXY FOR GAAS-ON-INP OPTOELECTRONIC INTEGRATED-CIRCUITS (OEICS)
    OSULLIVAN, PJ
    ALLAN, DA
    BIRDSALL, P
    GILBERT, MJ
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1993, 8 (06) : 1179 - 1185
  • [47] Effect of incorporation efficiency on dopant behaviors in selective-area metalorganic vapor phase epitaxy
    Ekawa, M
    Fujii, T
    Tanahashi, T
    JOURNAL OF CRYSTAL GROWTH, 1997, 170 (1-4) : 685 - 688
  • [48] Selective-Area Epitaxy of InGaAsP Buffer Multilayer for In-Plane InAs Nanowire Integration
    Zannier, Valentina
    Li, Ang
    Rossi, Francesca
    Yadav, Sachin
    Petersson, Karl
    Sorba, Lucia
    MATERIALS, 2022, 15 (07)
  • [49] IMPROVED COMPOSITION HOMOGENEITY DURING SELECTIVE-AREA EPITAXY OF GAINAS USING A NOVEL IN PRECURSOR
    ECKEL, M
    OTTENWALDER, D
    SCHOLZ, F
    FRANKOWSKY, G
    WACKER, T
    HANGLEITER, A
    APPLIED PHYSICS LETTERS, 1994, 64 (07) : 854 - 856
  • [50] Selective-area growth of ZnSe on patterned GaAs(001) substrates by molecular beam epitaxy
    Yamazaki, Y
    Chang, JH
    Cho, MW
    Sekiguchi, T
    Yao, T
    JOURNAL OF CRYSTAL GROWTH, 2000, 214 : 202 - 206