Observation of regular defects formed on the surface of PbTe thin films grown by molecular beam epitaxy

被引:13
|
作者
Zhang, Bingpo [1 ]
Cai, Chunfeng [1 ]
Hu, Lian [1 ]
Wei, Xiaodong [1 ]
Wu, Huizhen [1 ]
机构
[1] Zhejiang Univ, Dept Phys, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
关键词
Lead telluride thin films; Regular shape defects; Scanning electron microscope; ELECTRONIC-STRUCTURE;
D O I
10.1016/j.apsusc.2010.09.039
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Regular shape defects on the surface of PbTe thin films grown by molecular beam epitaxy (MBE) were studied by scanning electron microscope (SEM). Two types of regular shape defects were observed on Te-rich PbTe films grown at substrate temperature T >= 235 degrees C with a beam flux ratio of Te to PbTe (R-f) to be 0.5 and at 280 degrees C with a R-f >= 0.4, which include cuboids and triangular pyramids. The formation mechanism of the observed regular shape defects is interpreted as following: They are the outcome of fast growth rate along {100} crystal planes that have the lowest surface energy and the enclosure of the {100} crystal planes. The formation of the regular shape defects in the growth of PbTe needs appropriate substrate temperature and Te-rich ambience. However, when R-f is decreased low enough to make the films slightly Pb-rich, triangular pits that originate from the insufficient glide of the threading dislocations along the main < 110 > {100} glide system of PbTe in Cottrell atmosphere, will be the main feature on the film surface. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1986 / 1989
页数:4
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