Native oxide growth on Si(100) surface in liquid environment

被引：2

作者：

Kubota, Harumitsu ^{[1
]}

Kawai, Akira ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Dept Elect Engn, Niigata 9402188, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2007年 / 20卷 / 06期

关键词：

native oxide; storage; methanol; surface treatment; lithography;

D O I：

10.2494/photopolymer.20.823

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A native oxide layer on a silicon substrate has an effect on adhesion of a resist micro pattern. Native oxide growth is investigated in various environments such as air, DI(deionized)-water and methanol. In air and DI-water, the native oxide thickness increases gradually as the storage time increases. On the other hand, in methanol, the growth rate of native oxide is quite low for the storage of 5h. In order to obtain a stable surface condition of Si substrate, these results can be applied effectively.

引用

页码：823 / 824

页数：2

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