A primary standard for 157 nm excimer laser measurements

被引：0

作者：

Cromer, CL ^{[1
]}

Dowell, ML ^{[1
]}

Jones, RD ^{[1
]}

Keenan, DA ^{[1
]}

Yang, S ^{[1
]}

机构：

[1] Natl Inst Stand & Technol, Boulder, CO 80305 USA

来源：

CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY | 2003年 / 683卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Two primary standard calorimeters have been developed for accurate measurements of 157 nm (F-2) excimer laser power and energy. The calorimeter specifications and design are discussed. Results from the construction and testing of the calorimeters, control electronics, data acquisition, and N-2 purge system are presented. These calorimeters have demonstrated a two-fold improvement in sensitivity over existing NIST excimer laser calorimeters. The measurement uncertainty from electrical calibrations is a five-fold improvement over the NIST 193 nm primary standard.

引用

页码：409 / 412

页数：4

共 50 条

[21] Wettability measurements of agarose thin films patterned by 193 nm ArF excimer laser
Al-Jarwany, Q. A.
Aesa, Abdulsattar A.
Mohammed, A. F.
Walton, C. D.
INDIAN JOURNAL OF PHYSICS, 2024, : 1157 - 1163
[22] Precise and smooth removal from polymer surfaces by VUV excimer laser ablation at 157 nm: PMMA.
Padeletti, G
Lapczyna, M
Stuke, M
PLASMA DEPOSITION AND TREATMENT OF POLYMERS, 1999, 544 : 3 - 8
[23] The formation of metallic nanoparticles in single crystal CaF2 under 157 nm excimer laser irradiation
Cramer, LP
Langford, SC
Dickinson, JT
JOURNAL OF APPLIED PHYSICS, 2006, 99 (05)
[24] The formation of metallic nanoparticles in single crystal CaF2 under 157 nm excimer laser irradiation
Cramer, L.P.
Langford, S.C.
Dickinson, J.T.
Journal of Applied Physics, 2006, 99 (05):
[25] GAIN MEASUREMENTS AT 157 NM IN AN F2 PULSED DISCHARGE MOLECULAR LASER
CEFALAS, AC
SKORDOULIS, C
KOMPITSAS, M
NICOLAIDES, CA
OPTICS COMMUNICATIONS, 1985, 55 (06) : 423 - 426
[26] NIST standard for excimer laser energy
Semiconductor International, 1995, 18 (05):
[27] High repetition rate 157 nm Mini-Excimer-Lasers
Görtler, A
Strowitzki, C
Geiger, S
XIII INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE, 2000, 4184 : 330 - 333
[28] Laser optics cover the range 157 nm to 1064 nm
不详
OPTICS AND LASER TECHNOLOGY, 1999, 31 (05): : VIII - VIII
[29] Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures
A.V. Azarov
P.J.M. Peters
K.-J. Boller
Applied Physics B, 2008, 90 : 455 - 460
[30] Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures
Azarov, A. V.
Peters, P. J. M.
Boller, K. -J.
APPLIED PHYSICS B-LASERS AND OPTICS, 2008, 90 (3-4): : 455 - 460

← 1 2 3 4 5 →