Importance of intersystem crossing in the C(3P) + SiH4 reaction

被引:2
|
作者
Mandal, Mrinmoy [1 ]
Mahata, Prabhash [1 ]
Maiti, Biswajit [1 ]
机构
[1] Banaras Hindu Univ, Inst Sci, Dept Chem, Varanasi 221005, Uttar Pradesh, India
关键词
ATOMIC CARBON; DYNAMICS; METHANE;
D O I
10.1039/c9cp06680b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The contribution of intersystem crossing (ISC) in the C(P-3) + SiH4 reaction that leads to products formation in the singlet electronic state is investigated using a direct dynamics trajectory surface hopping (TSH) method with Tully's fewest switches algorithm. Interestingly, in contrast to the O(P-3) + SiH4 reaction with no ISC effect, for the title reaction we observed similar to 7% product formation through ISC despite weak spin-orbit coupling interactions (less than 25 cm(-1)) between the ground singlet and triplet states. This is presumably because of the topological differences in the potential energy surfaces of the two reactions at the entrance channel. The O(P-3) + SiH4 reaction follows either an addition reaction (with shallow attractive potential and a late singlet-triplet crossing) or a direct abstraction pathway with singlet-triplet crossing at near or after the top of the barrier making ISC ineffective. On the other hand, an insertion mechanism is exclusively followed by the C(P-3) + SiH4 reaction with no entrance barrier to the reaction in the triplet state. The triplet insertion complex initially formed ((H3SiCH)-H-3) can go to the singlet state through ISC due to the fact that the triplet-singlet crossing is accessed several times during the course of the reaction. Our computed overall product angular distributions for H and H-2 elimination channels are found to be broad and flat or nearly isotropic in nature indicating the formation of stable intermediate complexes, which corroborates the most recent crossed molecular-beam study.
引用
收藏
页码:8418 / 8426
页数:9
相关论文
共 50 条
  • [21] Theoretical studies of intersystem crossing effects in the O(3P,1D)+H2 reaction
    Maiti, B
    Schatz, GC
    JOURNAL OF CHEMICAL PHYSICS, 2003, 119 (23): : 12360 - 12371
  • [22] Theoretical study on the reaction mechanism of SiH3+O(3P)
    Yang, Y
    Zhang, WJ
    Gao, XM
    Pei, SX
    Shao, J
    Huang, W
    Qu, J
    Liu, AL
    CHINESE JOURNAL OF CHEMICAL PHYSICS, 2005, 18 (05) : 740 - 744
  • [23] THE AL(2P)(SIH4) COMPLEX AND THE PHOTOREVERSIBLE OXIDATIVE-ADDITION/REDUCTIVE-ELIMINATION REACTION - AL(2P)(SIH4)-][-H3SIALH
    LEFCOURT, MA
    OZIN, GA
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1988, 110 (20) : 6888 - 6890
  • [24] KINETIC AND THERMOCHEMICAL STUDY OF THE SIH3 + HBR REVERSIBLE SIH4 + BR AND SIH3 + HI REVERSIBLE SIH4 + I EQUILIBRIA
    SEETULA, JA
    FENG, Y
    GUTMAN, D
    SEAKINS, PW
    PILLING, MJ
    JOURNAL OF PHYSICAL CHEMISTRY, 1991, 95 (04): : 1658 - 1664
  • [25] Adsorption and reaction of SiH4 and oxygen on Pd(111)
    Kershner, Dylan C.
    Medlin, J. Will
    SURFACE SCIENCE, 2008, 602 (03) : 786 - 794
  • [26] Experimental and Theoretical Studies on the Dynamics of the O(3P) + Propene Reaction: Primary Products, Branching Ratios, and Role of Intersystem Crossing
    Leonori, Francesca
    Balucani, Nadia
    Nevrly, Vaclav
    Bergeat, Astrid
    Falcinelli, Stefano
    Vanuzzo, Gianmarco
    Casavecchia, Piergiorgio
    Cavallotti, Carlo
    JOURNAL OF PHYSICAL CHEMISTRY C, 2015, 119 (26): : 14632 - 14652
  • [27] Kinetic studies of the reaction of Cl atoms with SiH4
    Kambanis, KG
    Lazarou, YG
    Papagiannakopoulos, P
    JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS, 1996, 92 (18): : 3299 - 3303
  • [28] Arrhenius parameters for the reaction of H atoms with SiH4
    Arthur, NL
    Miles, LA
    JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS, 1997, 93 (24): : 4259 - 4264
  • [29] CHEMIIONIZATION AND CHEMILUMINESCENCE IN THE REACTION OF SIH4 WITH ACTIVE NITROGEN
    HORIE, O
    POTZINGER, P
    REIMANN, B
    CHEMICAL PHYSICS LETTERS, 1986, 129 (03) : 231 - 236
  • [30] Study on silicidation reaction of Fe nanodots with SiH4
    Furuhata, Hiroshi
    Makihara, Katsunori
    Shimura, Yosuke
    Fujimori, Shuntaro
    Imai, Yuki
    Ohta, Akio
    Taoka, Noriyuki
    Miyazaki, Seiichi
    APPLIED PHYSICS EXPRESS, 2022, 15 (05)