Measuring van der Waals and electrostatic forces for an atomic force microscope probe contacting with metal surfaces

被引：0

作者：

Dedkov, G. V. ^{[1
]}

Dedkova, E. G. ^{[1
]}

Tegaev, R. I. ^{[1
]}

Khokonov, Kh. B. ^{[1
]}

机构：

[1] Kabardino Balkar State Univ, Nalchik, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2008年 / 34卷 / 01期

关键词：

68.37.Ps; 87.64.Dz;

D O I：

10.1134/S1063785008010069

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A contact force spectrometry technique was used to measure the van der Waals and electrostatic forces acting on platinum-coated silicon probes contacting with metal films on silicon substrates. It is shown that the results of such measurements can be used for determining the geometric characteristics of probes and the Hamaker constant of contacting materials. The experimental data well agree with the theoretical values.

引用

页码：17 / 21

页数：5

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