Edge termination study and fabrication of a 4H-SiC junction barrier Schottky diode

被引:5
|
作者
Chen Feng-Ping [1 ]
Zhang Yu-Ming [1 ]
Zhang Yi-Men [1 ]
Tang Xiao-Yan [1 ]
Wang Yue-Hu [1 ]
Chen Wen-Hao [2 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
[2] Xidian Univ, Sch Tech Phys, Xian 710071, Peoples R China
基金
中国国家自然科学基金;
关键词
4H-SiC; junction barrier Schottky; offset field plate; electrical characteristics;
D O I
10.1088/1674-1056/20/11/117301
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-mu m P-type implantation window spacing gives an optimum trade-off between forward drop voltage and leakage current density for these diodes, yielding a specific on-resistance of 8.3 m Omega.cm(2). A JBS diode with a turn-on voltage of 0.65 V and a reverse current density less than 1 A/cm(2) under 500 V is fabricated, and the reverse recovery time is tested to be 80 ns, and the peak reverse current is 28.1 mA. Temperature-dependent characteristics are also studied in a temperature range of 75 degrees C-200 degrees C. The diode shows a stable Schottky barrier height of up to 200 degrees C and a stable operation under a continuous forward current of 100 A/cm(2).
引用
收藏
页数:5
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