Edge termination study and fabrication of a 4H-SiC junction barrier Schottky diode

被引:5
|
作者
Chen Feng-Ping [1 ]
Zhang Yu-Ming [1 ]
Zhang Yi-Men [1 ]
Tang Xiao-Yan [1 ]
Wang Yue-Hu [1 ]
Chen Wen-Hao [2 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
[2] Xidian Univ, Sch Tech Phys, Xian 710071, Peoples R China
基金
中国国家自然科学基金;
关键词
4H-SiC; junction barrier Schottky; offset field plate; electrical characteristics;
D O I
10.1088/1674-1056/20/11/117301
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-mu m P-type implantation window spacing gives an optimum trade-off between forward drop voltage and leakage current density for these diodes, yielding a specific on-resistance of 8.3 m Omega.cm(2). A JBS diode with a turn-on voltage of 0.65 V and a reverse current density less than 1 A/cm(2) under 500 V is fabricated, and the reverse recovery time is tested to be 80 ns, and the peak reverse current is 28.1 mA. Temperature-dependent characteristics are also studied in a temperature range of 75 degrees C-200 degrees C. The diode shows a stable Schottky barrier height of up to 200 degrees C and a stable operation under a continuous forward current of 100 A/cm(2).
引用
收藏
页数:5
相关论文
共 50 条
  • [21] 3 kV Schottky barrier diode in 4H-SiC
    Wahab, Q.
    Kimoto, T.
    Ellison, A.
    Hallin, C.
    Tuominen, M.
    Yakimova, R.
    Henry, A.
    Bergman, J.P.
    Janzen, E.
    Applied Physics Letters, 1998, 72 (04):
  • [22] Reverse characteristics of a 4H-SiC Schottky barrier diode
    Hatakeyama, T
    Shinohe, T
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1169 - 1172
  • [23] Ni, Ti/4H-SiC Schottky barrier diode
    Wang, Hao
    Bai, Song
    Chen, Gang
    Li, Zheyang
    Liu, Liuting
    Chen, Xuelan
    Shao, Kai
    Guti Dianzixue Yanjiu Yu Jinzhan/Research and Progress of Solid State Electronics, 2007, 27 (04): : 464 - 467
  • [24] Fabrication of a 600-V/20-A 4H-SiC schottky barrier diode
    Kang, In-Ho
    Kim, Sang-Cheol
    Moon, Jung-Hyeon
    Bahng, Wook
    Kim, Nam-Kyun
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2014, 64 (12) : 1886 - 1891
  • [25] Fabrication of a 600-V/20-A 4H-SiC schottky barrier diode
    In-Ho Kang
    Sang-Cheol Kim
    Jung-Hyeon Moon
    Wook Bahng
    Nam-Kyun Kim
    Journal of the Korean Physical Society, 2014, 64 : 1886 - 1891
  • [26] Junction barrier Schottky diodes in 4H-SiC and 6H-SiC
    Dahlquist, F
    Zetterling, CM
    Ostling, M
    Rottner, K
    SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 1061 - 1064
  • [27] Junction Barrier Schottky diodes in 4H-SiC and 6H-SiC
    Royal Inst of Technology, Kista, Sweden
    Mater Sci Forum, pt 2 (1061-1064):
  • [28] Leakage current in Ti/4H-SiC Schottky barrier diode
    Ohtsuka, K
    Matsuno, Y
    Kuroda, K
    Sugimoto, H
    Tarui, Y
    Imaizumi, M
    Takami, T
    PHYSICA B-CONDENSED MATTER, 2006, 376 : 370 - 373
  • [29] Surface Passivation of Ti/4H-SiC Schottky Barrier Diode
    Khalid, Muhammad
    Riaz, Saira
    Naseem, Shahzad
    COMMUNICATIONS IN THEORETICAL PHYSICS, 2012, 58 (04) : 577 - 582
  • [30] Surface Passivation of Ti/4H-SiC Schottky Barrier Diode
    Muhammad Khalid
    Saira Riaz
    Shahzad Naseem
    Communications in Theoretical Physics, 2012, 58 (10) : 577 - 582