Optical properties and electrical properties of heavily Al-doped ZnSe layers

被引:1
|
作者
Oh, D. C. [1 ,5 ]
Takai, T. [1 ]
Im, I. H. [1 ]
Park, S. H. [1 ]
Hanada, T. [1 ]
Yao, T. [1 ,6 ]
Song, J. S. [2 ]
Chang, J. H. [3 ]
Makino, H. [4 ]
Han, C. S. [5 ]
Koo, K. H. [5 ]
机构
[1] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] NeosemiTech Corp, Seo Ku, Inchon 404310, South Korea
[3] Korea Maritime Univ, Dept Semicond Phys, Youngdo Ku, Pusan 606791, South Korea
[4] Kochi Univ Technol, Res Inst, Mat Design Ctr, Kochi 7828502, Japan
[5] Hoseo Univ, Dept Def Sci & Technol, Asan 336795, Asan, South Korea
[6] Tohoku Univ, Interdisciplinary Res Ctr, Aoba Ku, Sendai, Miyagi 9808578, Japan
来源
基金
新加坡国家研究基金会;
关键词
D O I
10.1116/1.2836404
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have investigated optical properties and electrical properties of electrically degraded ZnSe layers by heavy Al doping, where their electron concentrations lie in the range of 7 X 10(17)-6 X 10(18) cm(-3). Low-temperature photoluminescence exhibits two dominant radiative trap centers of 1.97 eV (RDI) and 2.25 eV (RD2), which are ascribed to V-zn-related complex defects. Deep-level-transient spectroscopy shows two electron-trap centers at 0.16 eV (ND1) and 0.80 eV (ND2) below the conduction-band minimum. On the other hand, it is found that RD2 is dominant in relatively lightly doped ZnSe:Al layers below 7 X 10(18) cm(-3) and RD1 is dominant in more heavily doped layers near 1 X 10(19) cm(-3), while ND1 and ND2 are independent of A1 doping concentration and their trap densities are estimated be below 3 X 10(16) cm(-3). This indicates that RD1 and RD2 cause the carrier compensation in heavily doped ZnSe:Al layers. Their electron transport mechanism can be explained by ionized-impurity scattering mechanism. (C) 2008 American, Vacuum Society.
引用
收藏
页码:259 / 264
页数:6
相关论文
共 50 条
  • [41] Effects of annealing on structural, optical and electrical properties of Al-doped ZnO thin films
    Yanwei Chen
    Wenhua Yu
    Yichun Liu
    Science in China Series G: Physics, Mechanics and Astronomy, 2004, 47 : 588 - 596
  • [42] Effects of Al Diffusion Process on the Electrical, Optical, and Structural Properties of Transparent Conducting Al-doped ZnO
    Bhaskar Parida
    Seonghoon Jeong
    Hyunsoo Kim
    Journal of the Korean Physical Society, 2018, 73 : 917 - 921
  • [43] Effects of Al Diffusion Process on the Electrical, Optical, and Structural Properties of Transparent Conducting Al-doped ZnO
    Parida, Bhaskar
    Jeong, Seonghoon
    Kim, Hyunsoo
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2018, 73 (07) : 917 - 921
  • [44] Tailoring of optical and electrical properties of transparent and conductive Al-doped ZnO films by adjustment of Al concentration
    Zhang, Wu
    Gan, Jie
    Li, Lequn
    Hu, Zhigao
    Shi, Liqun
    Xu, Ning
    Sun, Jian
    Wu, Jiada
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2018, 74 : 147 - 153
  • [45] Deep-level-transient spectroscopy of heavily Al-doped ZnSe layers grown by molecular-beam epitaxy
    Oh, DC
    Takai, T
    Hanada, T
    Cho, MW
    Yao, T
    Song, JS
    Chang, JH
    Lu, F
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (12) : 7332 - 7337
  • [46] Electrical and optical properties of heavily Ge-doped AlGaN
    Blasco, R.
    Ajay, A.
    Robin, E.
    Bougerol, C.
    Lorentz, K.
    Alves, L. C.
    Mouton, I
    Amichi, L.
    Grenier, A.
    Monroy, E.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (12)
  • [47] Deep-level-transient spectroscopy of heavily Al-doped ZnSe layers grown by molecular-beam epitaxy
    Oh, D.C.
    Takai, T.
    Hanada, T.
    Cho, M.W.
    Yao, T.
    Song, J.S.
    Chang, J.H.
    Lu, F.
    1600, American Institute of Physics Inc. (96):
  • [48] Temperature and doping dependencies of electrical properties in Al-doped 4H-SiC epitaxial layers
    Koizumi, Atsushi
    Suda, Jun
    Kimoto, Tsunenobu
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (01)
  • [50] Study of Electrical, Optical and Structural Properties of Al-Doped ZnO Thin Films on PEN Substrates
    Agarwal, Mohit
    Modi, Pankaj
    Dusane, R. O.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2013, 5 (02)