Study of Structural and Mechanical Properties of WN/a-Si3N4 Hard Coatings Grown by Plasma Focus

被引：5

作者：

Hussnain, Ali ^{[1
,2
]}

Rawat, Rajdeep Singh ^{[1
]}

Seng, Tan Kim ^{[1
]}

Ahmad, Riaz ^{[3
]}

Hussain, Tousif ^{[3
]}

Lee, Paul ^{[1
]}

Zhong, Chen ^{[4
]}

Lu, Shen ^{[5
]}

Zheng, Zhang ^{[5
]}

机构：

[1] Nanyang Technol Univ, Natl Inst Educ, NSSE, Singapore 637616, Singapore

[2] Govt Coll Univ, Dept Phys, Lahore 54000, Pakistan

[3] Govt Coll Univ, CASP, Lahore 54000, Pakistan

[4] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore

[5] ASTAR, Inst Mat Res & Engn, Singapore 117602, Singapore

来源：

JOURNAL OF FUSION ENERGY | 2015年 / 34卷 / 02期

关键词：

Plasma focus; Tungsten nitride; Thin films; Nano-indentation; XRD; XPS; Morphology; ELECTRON-BEAMS; THIN-FILMS; ION IRRADIATION; DEPOSITION; SILICON; STABILITY; DEVICE;

D O I：

10.1007/s10894-014-9813-3

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

WN/a-Si3N4 thin films have been synthesized by utilizing the energetic ion/electron species emanated from hot, dense pinched plasma column in UNU/ICTP plasma focus operated with nitrogen gas. Structural, chemical, morphological and mechanical properties of synthesized films are studied using X-ray diffraction (XRD), X-ray photoelectron spectroscopic (XPS), field emission scanning electron microscopy (FESEM) and nano-indentation respectively. XRD spectra show WN2, WN, WSi2 phases on exposed samples. XPS results confirm W-Si-N chemical bonding in synthesized films. FESEM micrographs show uniform granular structure of synthesized WN/a-Si3N4 thin films. Surface morphology of synthesized thin films shows that increase in focus shots strongly affects the grain size due to change in ion energy flux. Nano-indentation results show significant increase in hardness with increase in focus shots with maximum hardness of 23.5 +/- A 1 GPa is observed for 45 focus shots.

引用

页码：435 / 442

页数：8

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