High average power and high repetition solid state laser for EUV lithography

被引：0
|
作者：
Fujita, Hisanori [1 ]
Nakatsuka, Masahiro [1 ]
Bhushan, Ravi [1 ]
Tsubakimoto, Kouji [1 ]
Yoshida, Hidetsugu [1 ]
Miyanaga, Noriaki [1 ]
Izawa, Yasukazu [1 ]
机构：
[1] Osaka Univ, Inst Laser Engn, Suita, Osaka 565, Japan
来源：
2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4 | 2007年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have been developing a high repetition (5 kHz) and high power (5 kW) Nd: YAG laser system pumped by cw LDs for EUV lithography. Design concepts and experimental results, will be reported.
引用
收藏
页码：734 / 735
页数：2
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