High average power and high repetition solid state laser for EUV lithography

被引：0
|
作者：
Fujita, Hisanori [1 ]
Nakatsuka, Masahiro [1 ]
Bhushan, Ravi [1 ]
Tsubakimoto, Kouji [1 ]
Yoshida, Hidetsugu [1 ]
Miyanaga, Noriaki [1 ]
Izawa, Yasukazu [1 ]
机构：
[1] Osaka Univ, Inst Laser Engn, Suita, Osaka 565, Japan
来源：
2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4 | 2007年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have been developing a high repetition (5 kHz) and high power (5 kW) Nd: YAG laser system pumped by cw LDs for EUV lithography. Design concepts and experimental results, will be reported.
引用
收藏
页码：734 / 735
页数：2
相关论文
共 50 条
  • [31] Laser Drilling using a High Repetition Rate and High Average Power Femtosecond Fiber CPA System
    Ancona, A.
    Rademaker, K.
    Roeser, F.
    Limpert, J.
    Nolte, S.
    Tuenermann, A.
    2008 CONFERENCE ON LASERS AND ELECTRO-OPTICS & QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE, VOLS 1-9, 2008, : 756 - 757
  • [32] Status of the High Average Power Diode-Pumped Solid State Laser Development at HiLASE
    Novak, Ondrej
    Miura, Taisuke
    Smrz, Martin
    Chyla, Michal
    Nagisetty, Siva Sankar
    Muzik, Jiri
    Linnemann, Jens
    Turcicova, Hana
    Jambunathan, Venkatesan
    Slezak, Ondrej
    Sawicka-Chyla, Magdalena
    Pilar, Jan
    Bonora, Stefano
    Divoky, Martin
    Mesicek, Jakub
    Pranovich, Alina
    Sikocinski, Pawel
    Huynh, Jaroslav
    Severova, Patricie
    Navratil, Petr
    Vojna, David
    Horackova, Lucie
    Mann, Klaus
    Lucianetti, Antonio
    Endo, Akira
    Rostohar, Danijela
    Mocek, Tomas
    APPLIED SCIENCES-BASEL, 2015, 5 (04): : 637 - 665
  • [33] Design of High Average Power Solid-State Transmitter
    Jain, Akhilesh
    Sharma, D. K.
    Gupta, A. K.
    Pathak, K.
    Lad, M. R.
    2015 IEEE APPLIED ELECTROMAGNETICS CONFERENCE (AEMC), 2015,
  • [34] Solid state Raman laser for frequency conversion and beam cleanup of high average power lasers
    Oien, A
    Tucker, P
    Bennett, G
    McKinnie, I
    Smith, D
    HIGH-POWER LASER ABLATION III, 2000, 4065 : 708 - 718
  • [35] Pulsed laser deposition with a high average power free electron laser: Benefits of subpicosecond pulses with high repetition rate
    Reilly, A
    Allmond, C
    Watson, S
    Gammon, J
    Kim, JG
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) : 3098 - 3101
  • [36] High-efficiency bispectral laser source for EUV lithography
    Zhevlakov, A. P.
    Seisyan, R. P.
    Bespalov, V. G.
    Elizarov, V. V.
    Grishkanich, A. S.
    Kascheev, S. V.
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING (LAMOM) XXI, 2016, 9735
  • [37] Resist outgassing characterization for qualification in high power EUV Lithography
    Takahashi, Toshiya
    Sugie, Norihiko
    Katayama, Kazuhiro
    Takagi, Isamu
    Kikuchi, Yukiko
    Shiobara, Eishi
    Tanaka, Hiroyuki
    Inoue, Soichi
    Watanabe, Takeo
    Harada, Tetsuo
    Kinoshita, Hiroo
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322
  • [38] Molybdenum carbide pellicle for high-power EUV lithography
    Kim, Yongkyung
    Seong, Kihun
    Yoon, Jonghyuk
    Lee, Donggi
    Moon, Seungchan
    Jang, Sung Kyu
    Kim, Hyun-Mi
    Kim, Seul-Gi
    Ahn, Jinho
    Kim, Hyeongkeun
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023, 2023, 12750
  • [39] High-power EUV lithography lightsources come of age
    Brandt, David C.
    Farrar, Nigel R.
    SOLID STATE TECHNOLOGY, 2009, 52 (09) : 10 - +
  • [40] High repetition rate high average power all-normal dispersion Yb:fiber ring laser
    Yang, Hongyu
    Li, Peng
    Wang, Xi
    Li, Chen
    Wang, Aimin
    Zhang, Zhigang
    2011 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2011,
12345