共 50 条
- [31] Effect of 3 nm gate length scaling in junctionless double surrounding gate SiNT MOSFET by using triple material gate engineering MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2021, 27 (10): : 3869 - 3874
- [32] Effect of 3 nm gate length scaling in junctionless double surrounding gate SiNT MOSFET by using triple material gate engineering Microsystem Technologies, 2021, 27 : 3869 - 3874
- [38] Heterojunction TFET Scaling and Resonant-TFET for Steep Subthreshold Slope at sub-9nm Gate-Length 2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2013,