Effects of Gate-Length Scaling on Microwave MOSFET Performance

被引:16
|
作者
Crupi, Giovanni [1 ]
Schreurs, Dominique M. M. -P. [2 ]
Caddemi, Alina [3 ]
机构
[1] Univ Messina, Dept Biomed & Dent Sci & Morphofunct Imaging, I-98125 Messina, Italy
[2] Katholieke Univ Leuven, Dept Elect Engn, B-3001 Leuven, Belgium
[3] Univ Messina, Dept Engn, I-98166 Messina, Italy
来源
ELECTRONICS | 2017年 / 6卷 / 03期
关键词
equivalent circuit; gate length; MOSFET; microwave frequency; scattering parameter measurements; SMALL-SIGNAL; EQUIVALENT-CIRCUIT; EXTRACTION METHOD; BEHAVIOR; MODEL; HEMT; FETS;
D O I
10.3390/electronics6030062
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper focuses on the extraction of an accurate small-signal equivalent circuit for metal-oxide-semiconductor field-effect transistors (MOSFETs). An analytical modeling approach was developed and successfully validated through the comparison between measured and simulated scattering parameters. The extraction of the equivalent circuit elements allowed for the estimation of the intrinsic unity current-gain cutoff frequency, which is a crucial figure of merit for assessing the high-frequency performance. The experimental data show that the cutoff frequency of the tested devices exhibits a nearly ideal scaling behavior with decreasing gate length.
引用
收藏
页数:10
相关论文
共 50 条
  • [21] Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET
    Uchechukwu, Maduagwu Anthony
    Srivastava, Viranjay M.
    IEEE ACCESS, 2020, 8 : 121204 - 121210
  • [22] High performance 0.14 μm gate-length AlGaN/GaN power HEMTs on SiC
    Jessen, GH
    Fitch, RC
    Gillespie, JK
    Via, GD
    Moser, NA
    Yannuzzi, MJ
    Crespo, A
    Sewell, JS
    Dettmer, RW
    Jenkins, TJ
    Davis, RF
    Yang, J
    Khan, MA
    Binari, SC
    IEEE ELECTRON DEVICE LETTERS, 2003, 24 (11) : 677 - 679
  • [23] Leakage reduction in SOCs using gate-length biasing
    Dobre, Sorin
    Cao, Ke
    Severson, Matt
    Matar, Charlie
    Sheikh, Omer
    SOLID STATE TECHNOLOGY, 2006, 49 (09) : 51 - +
  • [24] 60 nm gate-length Si/SiGe HEMT
    Kasamatsu, A
    Kasai, K
    Hikosaka, K
    Matsui, T
    Mimura, T
    APPLIED SURFACE SCIENCE, 2004, 224 (1-4) : 382 - 385
  • [25] Gate-length biasing for runtime-leakage control
    Gupta, Puneet
    Kahng, Andrew B.
    Sharma, Puneet
    Sylvester, Dennis
    IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 2006, 25 (08) : 1475 - 1485
  • [26] VERY SHORT GATE-LENGTH GAAS-MESFETS
    PATRICK, W
    MACKIE, WS
    BEAUMONT, SP
    WILKINSON, CDW
    OXLEY, CH
    IEEE ELECTRON DEVICE LETTERS, 1985, 6 (09) : 471 - 472
  • [27] Microwave performance of 0.3-μm gate-length multi-finger AlGaN/GaN heterojunction FETs with minimized current collapse
    Kunihiro, K
    Kasahara, K
    Takahashi, Y
    Ohno, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (4B): : 2431 - 2434
  • [28] Simulation study of the 20 nm gate-length Ge implant-free quantum well p-MOSFET
    Chan, K. H.
    Benbakhti, B.
    Riddet, C.
    Watling, J. R.
    Asenov, A.
    MICROELECTRONIC ENGINEERING, 2011, 88 (04) : 362 - 365
  • [30] Assessment of Quantum Scaling Length Model for Cylindrical Surrounding Double-Gate (CSDG) MOSFET
    Maduagwu U.A.
    Srivastava V.M.
    Micro and Nanosystems, 2021, 13 (04): : 467 - 472