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Correlation between structural and optical properties of a-plane GaN films grown on r-plane sapphire by metal organic chemical-vapor deposition
被引:3
|作者:
Jung, Mina
[1
]
Chang, Jiho
[1
]
Lee, Hyunjae
[2
]
Ha, Jun-seok
[2
]
Park, Jin-sub
[2
]
Park, Seungwhan
[2
]
Fujii, Katsushi
[2
]
Yao, Takafumi
[2
]
Kil, Gyung-suk
[3
]
Lee, Seogwoo
[4
]
Cho, Myungwhan
[4
]
Whang, Sungmin
[5
]
Seo, Yong-gon
[5
]
机构:
[1] Natl Korea Maritime Univ, Dept Nanosemicond Engn, Pusan 606791, South Korea
[2] Tohoku Univ, Interdisciplinary Res Ctr, Sendai, Miyagi 9808578, Japan
[3] Natl Korea Maritime Univ, Div Elect & Elect Engn, Pusan, South Korea
[4] Wavesquare Co, Yongin 449863, Gyeonggi, South Korea
[5] Korea Elect Technol Inst, Songnam 463816, Gyeonggi, South Korea
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
|
2010年
/
28卷
/
03期
关键词:
gallium compounds;
III-V semiconductors;
MOCVD;
photoluminescence;
semiconductor growth;
semiconductor thin films;
spectral line broadening;
stacking faults;
THIN-FILMS;
ALGAN;
D O I:
10.1116/1.3388889
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The authors have studied the photoluminescence (PL) intensities of a-plane (11-20) GaN films (a-GaN) as a function of x-ray rocking-curve (XRC) linewidth values measured in both c- and m-axis directions. PL intensity of well-known luminescence lines such as 3.47 eV (bound exciton emission), 3.41 eV (basal-plane stacking fault related emission), and 3.29 eV (defect induced emission) are discussed in terms of XRC linewidth values. PL intensities reveal a close relationship with XRC linewidth measured in the c-axis direction, while an unusual relationship was observed between PL intensity and XRC linewidth in the m-axis direction. Inhomogeneous strain along the m-axis direction of a-GaN film is discussed as a cause of XRC linewidth broadening, rather than the formation of structural defects. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3388889]
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页码:623 / 626
页数:4
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