Mechanics of end effects in thin film and substrate stress distributions

被引：3
|
作者：
Murray, CE [1 ]
Noyan, IC [1 ]
机构：
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
来源：
RESIDUAL STRESSES VII, PROCEEDINGS | 2005年 / 490-491卷
关键词：
stress; x-ray diffraction; mechanics;
D O I：
10.4028/www.scientific.net/MSF.490-491.13
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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收藏
页码：13 / 18
页数：6
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