Tunneling-triggered bipolar action in junctionless tunnel field-effect transistor

被引:8
|
作者
Gundapaneni, Suresh [1 ]
Goswami, Aranya [2 ]
Badami, Oves [3 ]
Cuduvally, Ramya [4 ]
Konar, Aniruddha [1 ]
Bajaj, Mohit [1 ]
Murali, Kota V. R. M. [1 ]
机构
[1] IBM India, SRDC, Bangalore, Karnataka, India
[2] Indian Inst Technol, Dept Elect & Elect Commun, Kharagpur 721302, W Bengal, India
[3] Indian Inst Technol, Dept Elect Engn, Bombay 400076, Maharashtra, India
[4] SUNY Albany, Coll Nanoscale Sci & Engn, Albany, NY 12222 USA
关键词
Semiconductor junctions;
D O I
10.7567/APEX.7.124302
中图分类号
O59 [应用物理学];
学科分类号
摘要
We analyse a novel hybrid semiconductor field-effect transistor (FET), known as the junctionless tunnel FET (JL-TFET). We show that a parasitic bipolar transistor action, which is highly undesirable in conventional metal/oxide/semiconductor FETs and junctionless transistors, is the mechanism that activates the JL-TFET ON state. It is found that the sub-threshold slope (SS) in the JL-TFET is strongly dependent on the silicon thickness and a sub-60 mV/decade SS is observed for a thin silicon body only. We further study the JL-TFET design parameters as regards the effects of the control gate workfunction, P-gate workfunction, and isolation region on the JL-TFET characteristics. (C) 2014 The Japan Society of Applied Physics
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页数:4
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