SOI;
cross-talk;
system on a chip;
SOS;
silicon on glass;
D O I:
10.1016/j.sse.2005.07.008
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Cross-talk between the noisy digital circuitry and the highly sensitive analog circuitry of integrated "system-on-a-chip" circuits is a serious problem. Silicon-on-insulator (Sol) substrates can offer a solution for co-integration of such components as the buried oxide (BOX) layer provides a degree of isolation between adjacent circuits. However, at frequencies above a few hundred MHz, the BOX layer becomes transparent to ac signals and cross-talk occurs through the silicon handle wafer. Improvements in cross-talk suppression can be achieved through the use of high resistivity silicon (HRS) handle wafers. However, it has been shown that oxide charge can induce a mobile charge at the interface of the BOX and HRS handle wafer. A polycrystalline silicon layer under the BOX traps the induced charge so that the resistance at the surface of the HRS is not compromised. Importantly, cross-talk suppression with this silicon based Sol technology is shown for the first time to be as effective as that obtained in silicon-on-sapphire (SOS) control samples. (c) 2005 Published by Elsevier Ltd.
机构:Univ Western Ontario, Fac Med & Dent, Dept Physiol & Pharmacol, London, ON N6A 5C1, Canada
Paciga, M
James, K
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机构:Univ Western Ontario, Fac Med & Dent, Dept Physiol & Pharmacol, London, ON N6A 5C1, Canada
James, K
Gillespie, JRJ
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机构:Univ Western Ontario, Fac Med & Dent, Dept Physiol & Pharmacol, London, ON N6A 5C1, Canada
Gillespie, JRJ
Wagner, GF
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机构:
Univ Western Ontario, Fac Med & Dent, Dept Physiol & Pharmacol, London, ON N6A 5C1, CanadaUniv Western Ontario, Fac Med & Dent, Dept Physiol & Pharmacol, London, ON N6A 5C1, Canada
机构:
Palo Alto VA Hlth Care Syst, PAVIR, Palo Alto, CA USA
Stanford Univ, Hematol, Stanford, CA 94305 USAPalo Alto VA Hlth Care Syst, PAVIR, Palo Alto, CA USA