Cross-talk suppression in SOI substrates

被引:9
|
作者
Baine, P
Jin, M
Gamble, HS
Armstrong, BM
Linton, D
Mohammed, F
机构
[1] Queens Univ Belfast, Sch Elect & Elect Engn, No Ireland Semicond Res Ctr, Belfast BT9 5AH, Antrim, North Ireland
[2] Queens Univ Belfast, Sch Elect & Elect Engn, Inst Elect Comp & IT, Belfast, Antrim, North Ireland
关键词
SOI; cross-talk; system on a chip; SOS; silicon on glass;
D O I
10.1016/j.sse.2005.07.008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cross-talk between the noisy digital circuitry and the highly sensitive analog circuitry of integrated "system-on-a-chip" circuits is a serious problem. Silicon-on-insulator (Sol) substrates can offer a solution for co-integration of such components as the buried oxide (BOX) layer provides a degree of isolation between adjacent circuits. However, at frequencies above a few hundred MHz, the BOX layer becomes transparent to ac signals and cross-talk occurs through the silicon handle wafer. Improvements in cross-talk suppression can be achieved through the use of high resistivity silicon (HRS) handle wafers. However, it has been shown that oxide charge can induce a mobile charge at the interface of the BOX and HRS handle wafer. A polycrystalline silicon layer under the BOX traps the induced charge so that the resistance at the surface of the HRS is not compromised. Importantly, cross-talk suppression with this silicon based Sol technology is shown for the first time to be as effective as that obtained in silicon-on-sapphire (SOS) control samples. (c) 2005 Published by Elsevier Ltd.
引用
收藏
页码:1461 / 1465
页数:5
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