Black Silicon: a New Manufacturing Method and Optical Properties

被引:2
|
作者
Nebol'sin, V. A. [1 ]
Swaikat, N. [1 ]
Vorob'ev, A. Yu. [1 ]
机构
[1] Voronezh State Tech Univ, Voronezh 394026, Russia
关键词
SURFACES;
D O I
10.1134/S1063785018120313
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new method for manufacturing nanostructured black silicon (b-Si) by growing cone-shaped (pointed) filamentous nanocrystals (nanowires, FNWs) on the surface of single-crystal Si-plates has been proposed. b-Si samples with reflectivity less than 0.1% have been obtained. It has been shown that the b-Si reflection coefficient depends on the sizes of the FNWs in the visible region of the spectrum: its minimum value (less than 0.1%) has been achieved at diameters at the base of the FNWs of 650-750 nm and a length of 1.5-2 mu m.
引用
收藏
页码:1055 / 1058
页数:4
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