Black Silicon: a New Manufacturing Method and Optical Properties

被引：2

作者：

Nebol'sin, V. A. ^{[1
]}

Swaikat, N. ^{[1
]}

Vorob'ev, A. Yu. ^{[1
]}

机构：

[1] Voronezh State Tech Univ, Voronezh 394026, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2018年 / 44卷 / 12期

关键词：

SURFACES;

D O I：

10.1134/S1063785018120313

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new method for manufacturing nanostructured black silicon (b-Si) by growing cone-shaped (pointed) filamentous nanocrystals (nanowires, FNWs) on the surface of single-crystal Si-plates has been proposed. b-Si samples with reflectivity less than 0.1% have been obtained. It has been shown that the b-Si reflection coefficient depends on the sizes of the FNWs in the visible region of the spectrum: its minimum value (less than 0.1%) has been achieved at diameters at the base of the FNWs of 650-750 nm and a length of 1.5-2 mu m.

引用

页码：1055 / 1058

页数：4

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