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INTERFACE ROUGHNESS IN SPUTTERED W/Si MULTILAYERS AND RELATED GROWTH MODELS

被引：0
|
作者：
Salditt, T. [1 ]
Metzger, T. H. [1 ]
Lott, D. [1 ]
Peisl, J. [1 ]
机构：
[1] Univ Muenchen, Sekt Phys, D-80539 Munich, Germany
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1996年 / 52卷
关键词：
D O I：
10.1107/S0108767396080981
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
MS12.02.01
引用
收藏
页码：C464 / C464
页数：1
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